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Recent Posts
- A head-to-head comparison of the ARM Cortex-M4 and –M0 processor cores by Jack Ganssle
- Friday Video: SoC in tiny 500mg backpack transforms cockroach into radio-controlled exploration vehicle
- Friday Video: A different kind of fab with some very, very cool machines
- Friday Video: Get the latest skinny on the IPC-2581 open interchange standard for PCB design
- Smartphones: Where PCIe has not gone before—but will. Sooner rather than later.
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- 39 low-cost boards for embedded Linux application development starting with Raspberry Pi. Want the list?
- How about a quick and easy guide to ARM Cortex processor cores? Got one for you from ARM TechCon 2011
- Want a peek at a possible Qualcomm 3D IC roadmap?
- The DDR4 SDRAM spec and SoC design. What do we know now?
- Friday Video: Two more low-cost, ARM-based, embedded-Linux development boards from ODROID and Google
- A head-to-head comparison of the ARM Cortex-M4 and –M0 processor cores by Jack Ganssle
- Friday Video: Webcam + Open-source video code + Arduino Uno microcontroller board + pan/tilt servo make automated face-tracker, prove the power of an apps-centric world
- 3D Thursday: Power is a killer app for TI’s PowerStack 3D packaging—parasitics vanish
- 3D Thursday: More on the Xilinx Virtex 7 with 2.5D tiling. Wave of the future or stopgap measure?
- Agilent knocks one out of the park with new, low-cost line of digital scopes—a very competitive entry into the low-end DSO market and a perfect example of EDA360 design using end-to-end design and apps.
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Category Archives: Double Patterning
3D Thursday: My breakfast with IBM’s Gary Patton leads to a discussion of 20nm and 14nm IC design
Yesterday I moderated a panel on 2(x)nm success at DAC and one of the panelists was Dr. Gary Patton, VP of IBM’s Semiconductor Research and Development Center in East Fishkill, NY. I’ve heard Dr. Patton speak before and he knows … Continue reading
Posted in 14nm, 20nm, 28nm, Double Patterning, EDA360, EUV, Silicon Realization, SoC, SoC Realization
Tagged Bipolar, CMOS, Extreme ultraviolet, FinFET, Gary Patton, IBM, Multiple patterning, TriGate
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What are the challenges of EUV lithography and the issues surrounding double patterning? CDNLive! presentation provides details.
Richard Goering has just published an excellent blog post on double patterning for 20nm and 14nm process geometries in his blog Industry Insights. The post is based on a paper presented by IBM Distinguished Engineer Lars Liebman at the recent … Continue reading
Posted in 14nm, 20nm, Double Patterning, EDA360, EUV, Silicon Realization
Tagged 20nm 14nm, Double Patterning, EUV, Extreme ultraviolet lithography, IBM, Lithography, Microprocessor Report
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Scaling the peaks to look at the 14nm cliff, Part 2: Tom Beckley from Cadence explains how we’re getting to 20nm and then on to 14nm and 10nm
This week at the ISQED Symposium in Silicon Valley, Tom Beckley who is the Senior VP of R&D for Custom IC and Signoff at Cadence opened the conference with a keynote covering the industry’s challenges and progress at 20nm and … Continue reading
Posted in 10nm, 14nm, 20nm, 28nm, Design Abstraction, Design Intent, DFM, Double Patterning, EDA360, IBM, Silicon Realization
Tagged 10nm, 14nm, 20nm, 28nm, extraction, FinFET, ISQED, layout, parasitic
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Here’s more food for thought regarding 20nm design. Do you know what it takes?
One week ago, I described some of the 20nm process node benefits and challenges discussed in Wei Lii Tan’s presentation at the recent Global Technology Conference. (See “Just how high is the 20nm design mountain of challenges?”) Now Richard Goering … Continue reading
Posted in 20nm, Double Patterning, EDA360, Silicon Realization
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