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Recent Posts
- A head-to-head comparison of the ARM Cortex-M4 and –M0 processor cores by Jack Ganssle
- Friday Video: SoC in tiny 500mg backpack transforms cockroach into radio-controlled exploration vehicle
- Friday Video: A different kind of fab with some very, very cool machines
- Friday Video: Get the latest skinny on the IPC-2581 open interchange standard for PCB design
- Smartphones: Where PCIe has not gone before—but will. Sooner rather than later.
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- 39 low-cost boards for embedded Linux application development starting with Raspberry Pi. Want the list?
- Friday Video: Webcam + Open-source video code + Arduino Uno microcontroller board + pan/tilt servo make automated face-tracker, prove the power of an apps-centric world
- 3D Thursday: Power is a killer app for TI’s PowerStack 3D packaging—parasitics vanish
- Friday Video: Two more low-cost, ARM-based, embedded-Linux development boards from ODROID and Google
- A head-to-head comparison of the ARM Cortex-M4 and –M0 processor cores by Jack Ganssle
- How about a quick and easy guide to ARM Cortex processor cores? Got one for you from ARM TechCon 2011
- The DDR4 SDRAM spec and SoC design. What do we know now?
- 3D Thursday: More on the Xilinx Virtex 7 with 2.5D tiling. Wave of the future or stopgap measure?
- Agilent knocks one out of the park with new, low-cost line of digital scopes—a very competitive entry into the low-end DSO market and a perfect example of EDA360 design using end-to-end design and apps.
- Want a peek at a possible Qualcomm 3D IC roadmap?
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Tag Archives: EUV
What are the challenges of EUV lithography and the issues surrounding double patterning? CDNLive! presentation provides details.
Richard Goering has just published an excellent blog post on double patterning for 20nm and 14nm process geometries in his blog Industry Insights. The post is based on a paper presented by IBM Distinguished Engineer Lars Liebman at the recent … Continue reading
Posted in 14nm, 20nm, Double Patterning, EDA360, EUV, Silicon Realization
Tagged 20nm 14nm, Double Patterning, EUV, Extreme ultraviolet lithography, IBM, Lithography, Microprocessor Report
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GLOBALFOUNDRIES talks FinFETs, EUV, 14nm, ETSOI. Any other bleeding-edge chipmaking terms you wanted to hear?
Near the end of his Global Technology Conference presentation last week, Senior VP of Technology and R&D Gregg Bartlett jumped to the future—namely 2014 to 2015. By then, GLOBALFOUNDRIES plans to be implementing the second production phase for its 20nm … Continue reading
Posted in EDA360, Globalfoundries, Silicon Realization
Tagged 14nm, 20nm, ETSOI, EUV, FinFET
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