Category Archives: EUV

Friday Video: Luigi Capodieci, a fellow at GLOBALFOUNDRIES, talks 20nm and below, EUV, FINFETs, and the state of the foundry business

Be sure to watch this excellent 13-minute interview done by Mark LePedus starring Luigi Capodieci, a fellow with GLOBALFOUNDRIES, to get a close-up-and-personal look at the state of the foundry business (it’s not dying), 20nm design, EUV in the wings, … Continue reading

Posted in 14nm, 20nm, EUV, Globalfoundries, Silicon Realization | Tagged , , | Leave a comment

3D Thursday: My breakfast with IBM’s Gary Patton leads to a discussion of 20nm and 14nm IC design

Yesterday I moderated a panel on 2(x)nm success at DAC and one of the panelists was Dr. Gary Patton, VP of IBM’s Semiconductor Research and Development Center in East Fishkill, NY. I’ve heard Dr. Patton speak before and he knows … Continue reading

Posted in 14nm, 20nm, 28nm, Double Patterning, EDA360, EUV, Silicon Realization, SoC, SoC Realization | Tagged , , , , , , , | Leave a comment

What are the challenges of EUV lithography and the issues surrounding double patterning? CDNLive! presentation provides details.

Richard Goering has just published an excellent blog post on double patterning for 20nm and 14nm process geometries in his blog Industry Insights. The post is based on a paper presented by IBM Distinguished Engineer Lars Liebman at the recent … Continue reading

Posted in 14nm, 20nm, Double Patterning, EDA360, EUV, Silicon Realization | Tagged , , , , , , | Leave a comment