Tag Archives: Extreme ultraviolet lithography

What are the challenges of EUV lithography and the issues surrounding double patterning? CDNLive! presentation provides details.

Richard Goering has just published an excellent blog post on double patterning for 20nm and 14nm process geometries in his blog Industry Insights. The post is based on a paper presented by IBM Distinguished Engineer Lars Liebman at the recent … Continue reading

Posted in 14nm, 20nm, Double Patterning, EDA360, EUV, Silicon Realization | Tagged , , , , , , | Leave a comment