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Recent Posts
- A head-to-head comparison of the ARM Cortex-M4 and –M0 processor cores by Jack Ganssle
- Friday Video: SoC in tiny 500mg backpack transforms cockroach into radio-controlled exploration vehicle
- Friday Video: A different kind of fab with some very, very cool machines
- Friday Video: Get the latest skinny on the IPC-2581 open interchange standard for PCB design
- Smartphones: Where PCIe has not gone before—but will. Sooner rather than later.
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- GLOBALFOUNDRIES’ 28nm process comes in three flavors. Which is right for you?
- A head-to-head comparison of the ARM Cortex-M4 and –M0 processor cores by Jack Ganssle
- Ingenious architectural features allow ST to extract maximum performance from new microcontroller family based on ARM Cortex-M4. Cost: less than 6 bucks in 1000s
- The DDR4 SDRAM spec and SoC design. What do we know now?
- 3D Thursday: Intel and FinFETs (Tri-Gate transistors)—a different kind of 3D
- What can you do with 45nm SOI? A lot, it turns out
- The WORD on ARM’s big.LITTLE Cortex-A15/A7 design philosophy from Jack Ganssle, a leading expert and consultant on embedded design and firmware development
- How do virtual prototyping, emulation, and FPGA prototyping differ? Answers from Frank Schirrmeister
- There’s a solar eclipse coming. Here’s a test shot from a Canon 60D dSLR, a Spiratone 400mm Sharpshooter, and a 2x telextender.
- Are FinFETs inevitable at 20nm? “Yes, no, maybe” says Professor Chenming Hu
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Tag Archives: Extreme ultraviolet
Friday Video: Luigi Capodieci, a fellow at GLOBALFOUNDRIES, talks 20nm and below, EUV, FINFETs, and the state of the foundry business
Be sure to watch this excellent 13-minute interview done by Mark LePedus starring Luigi Capodieci, a fellow with GLOBALFOUNDRIES, to get a close-up-and-personal look at the state of the foundry business (it’s not dying), 20nm design, EUV in the wings, … Continue reading
Posted in 14nm, 20nm, EUV, Globalfoundries, Silicon Realization
Tagged Extreme ultraviolet, FinFET, GlobalFoundries
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3D Thursday: My breakfast with IBM’s Gary Patton leads to a discussion of 20nm and 14nm IC design
Yesterday I moderated a panel on 2(x)nm success at DAC and one of the panelists was Dr. Gary Patton, VP of IBM’s Semiconductor Research and Development Center in East Fishkill, NY. I’ve heard Dr. Patton speak before and he knows … Continue reading
Posted in 14nm, 20nm, 28nm, Double Patterning, EDA360, EUV, Silicon Realization, SoC, SoC Realization
Tagged Bipolar, CMOS, Extreme ultraviolet, FinFET, Gary Patton, IBM, Multiple patterning, TriGate
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