Tag Archives: Extreme ultraviolet

Friday Video: Luigi Capodieci, a fellow at GLOBALFOUNDRIES, talks 20nm and below, EUV, FINFETs, and the state of the foundry business

Posted on July 20, 2012 by

Be sure to watch this excellent 13-minute interview done by Mark LePedus starring Luigi Capodieci, a fellow with GLOBALFOUNDRIES, to get a close-up-and-personal look at the state of the foundry business (it’s not dying), 20nm design, EUV in the wings, … Continue reading →

Posted in 14nm, 20nm, EUV, Globalfoundries, Silicon Realization | Tagged , , | Leave a comment

3D Thursday: My breakfast with IBM’s Gary Patton leads to a discussion of 20nm and 14nm IC design

Posted on June 7, 2012 by

Yesterday I moderated a panel on 2(x)nm success at DAC and one of the panelists was Dr. Gary Patton, VP of IBM’s Semiconductor Research and Development Center in East Fishkill, NY. I’ve heard Dr. Patton speak before and he knows … Continue reading →

Posted in 14nm, 20nm, 28nm, Double Patterning, EDA360, EUV, Silicon Realization, SoC, SoC Realization | Tagged , , , , , , , | Leave a comment